| Título | Interface-Induced Plasmon Nonhomogeneity in Nanostructured Metal-Dielectric Planar Metamaterial |
|---|---|
| Autores | Kovalev, A. I. , Wainstein, D. L. , Rashkovskiy, A. Yu. , Gago, R. , Soldera, F. , ENDRINO ARMENTEROS, JOSÉ LUIS, Fox-Rabinovich, G. S. |
| Publicación externa | Si |
| Medio | JOURNAL OF NANOMATERIALS |
| Alcance | Article |
| Naturaleza | Científica |
| Cuartil JCR | 2 |
| Cuartil SJR | 2 |
| Impacto JCR | 1.758 |
| Impacto SJR | 0.392 |
| Web | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84926442678&doi=10.1155%2f2015%2f876247&partnerID=40&md5=c66c030400253d87a97df776c942aeb3 |
| Fecha de publicacion | 01/01/2015 |
| ISI | 000352399000001 |
| Scopus Id | 2-s2.0-84926442678 |
| DOI | 10.1155/2015/876247 |
| Abstract | Transformations of the electronic structure in thin silver layers in metal-dielectric (TiAlN/Ag) multilayer nanocomposite were investigated by a set of electron spectroscopy techniques. Localization of the electronic states in the valence band and reduction of electron concentration in the conduction band was observed. This led to decreasing metallic properties of silver in the thin films. A critical layer thickness of 23.5 nm associated with the development of quantum effects was determined by X-ray photoelectron spectroscopy. Scanning Auger electron microscopy of characteristic energy losses provided images of plasmon localization in the Ag layers. The nonuniformity of plasmon intensities distribution near the metal-nitride interfaces was assessed experimentally. |
| Palabras clave | Auger electron spectroscopy; Electron spectroscopy; Electronic structure; Energy dissipation; Film preparation; Plasmons; Quantum electronics; Quantum theory; Scanning electron microscopy; Silver; Characteristic energy; Critical layer thickness; Electron concentration; Metal dielectrics; Metallic properties; Nanostructured metals; Quantum effects; Scanning auger electron microscopies; X ray photoelectron spectroscopy |
| Miembros de la Universidad Loyola |
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